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VGB-600-3HD Plasma Magnetron Sputtering Coater With 3 Sputtering Sources And Glove Box

VGB-600-3HD Thin-Film Battery Preparation System can perform experimental operations in a glove box, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. The system is equipped with three target guns and one RF power supply for sputter coating of various target materials. The RF power supply can be connected to any target head by a transfer switch.



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product details

VGB-600-3HD Plasma Magnetron Sputtering Coater With 3 Sputtering Sources And Glove Box

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VGB-600-3HD Thin-Film Battery Preparation System can perform experimental operations in a glove box, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. The system is equipped with three target guns and one RF power supply for sputter coating of various target materials. The RF power supply can be connected to any target head by a transfer switch.

 

Main Features

1. The system is equipped with three target guns and one RF power supply for sputter coating of various target materials. The RF power supply can be connected to any target head by a transfer switch. (The target gun can be exchanged according to customer needs).

2. A variety of thin films can be prepared with a wide range of applications.

3. Small size and easy to operate

4. Modular design of the whole machine; separate/split-type design of vacuum chamber, vacuum pump group and control power supply, which can be adjusted according to the actual needs of users. (optional)

5. The power supply can be selected according to the actual needs of the user. One power supply can control multiple target guns, or multiple power sources can control one single target gun.

6. The experimental operation can be carried out in the glove box, and various kinds of easily oxidized targets can be replaced for coating experiments.

 

 

Technical Parameters

Product Name

VGB-600-3HD Thin-Film Battery Preparation System

Product Model

VGB-600-3HD

Major Parameters

(Specification)

Three-head magnetron sputtering part:

1. Power supply voltage: 220V 50Hz

2. Total power: 2.5kW

3. Limit of vacuum degree: E-6mbar (E-3mbar can be reached when used with our company's mechanical pump equipment)

4. Heating temperature: RT-500℃, accuracy ±1℃ (Temperature can be increased according to actual needs.)

5. Number of target guns: 3 pcs

6. Cooling method of target gun: water cooling

7. Size of target material: Ø2″, thickness 0.1-5mm (different thicknesses due to different target materials)

8. Sputtering power supply: 300W (RF)/500W (DC)

9. Sample stage: Ø140mm

10. Speed of sample stage: adjustable within 1rpm to 20rpm

11. Working gas: Ar, N2 and other inert gases

12. Intake air path: Mass flow meter controls 2 air-intake paths, one is 100SCCM and the other is 200SCCM.

 

Glove box part:

1. Power supply: single-phase AC110V-220V 50Hz/60Hz

2. Shell material: 304 stainless steel

3. Glove box chamber: 1220mm×760mm×900mm

4. Front chamber: There are 2 front chambers, the large front chamber is Ø360mm×600mm, and the small front chamber is Ø150mm×300mm.

5. Chamber environment: water content<1ppm (20℃, 1atm), oxygen content <1ppm (20℃, 1atm)

6. Working gas: N2, Ar, He and other inert gases

7. Control gas: compressed air or inert gas

8. Reducing gas: a mixture of working gas and H(if the purification system only has the function of removing water, the reducing gas is the same as the working gas.)

9. Gas purification system:

German BASF deoxidizing material, American UOP high-efficiency water absorbing material, automatic control of regeneration process of the purification system, automatic water and oxygen removal functions, capable of continuously maintaining the gas purity (at the level of water<1ppm and oxygen <1ppm) in the long run

10. Pressure control system: The air pressure of the chamber can be automatically controlled by PLC touch screen, the control accuracy is ±1Pa, and it can also be manually controlled by a foot switch.

11. Filtration system: Filters are installed at the inlet and outlet ends, and the filtration accuracy is 0.3μm.

12. Control system: SIEMENS color touch screen (6 inches), PLC control system, Chinese and English bilingual switched

    * The water probe adopts American GE brand, with 0-1000ppm touch screen display and accuracy of 0.1ppm.

    * Oxygen transmitter adopts American AII brand, with 0-1000ppm touch screen display and accuracy of 0.1ppm.

    * The pressure sensor adopts American setra brand, with -2500-2500Pa touch screen display and accuracy of ±1Pa.

13. Vacuum pump: British EDWARDS brand with pumping speed 8.4m3/h-12m3/h

14. Gloves: American NORTH brand (butyl synthetic rubber)

15. Illuminating system: Philips brand (fluorescent tube)

Product Dimension

Three-head magnetron sputtering part: 950mm×460mm×810mm

Glove box part: 2300mm×1500mm×1900mm

 

Warranty

    One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)