VTC-600-3HD Plasma Magnetron Sputtering Coater With 3 Sputtering Sources
VTC-600-3HD Three-Head Magnetron Sputtering Coater is a coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-3HD three-head magnetron sputtering coater is equipped with three target guns, one RF power supply for sputter coating of non-conductive materials, and two DC power supplies for sputter coating of conductive materials.
Main Features
1. It is equipped with three target guns, one RF power supply is used for sputter coating of non-conductive materials, and two DC power supply is used for sputter coating of conductive materials (The target gun can be exchanged according to customer needs).
2. A variety of thin films can be prepared with a wide range of applications.
3. Small size and easy to operate
4. Modular design of the whole machine; separate/split-type design of vacuum chamber, vacuum pump group and control power supply, which can be adjusted according to the actual needs of users.
5. The power supply can be selected according to the actual needs of the user. One power supply can control multiple target guns, or multiple power sources can control one single target gun.
Technical Parameters
Product Name | VTC-600-3HD Threel-Head Magnetron Sputtering Coater |
Product Model | VTC-600-3HD |
Installation Conditions | This equipment is required to be used at an altitude of 1000m or less, a temperature of 25℃±15℃, and a humidity of 55%Rh±10%Rh. 1. Water: The equipment is equipped with a self-circulating water cooler (filling with pure water or deionized water) 2. Electricity: AC220V 50Hz, must have good grounding 3. gas: The equipment chamber needs to be filled with argon gas (purity 99.99% or more), and argon gas cylinders (with Ø6mm double ferrule joints) and pressure reducing valve need to be provided by users. 4. Workbench: size 1500mm×600mm×700mm, bearing more than 200kg 5. Ventilation device: needed |
Major Parameters (Specification) | 1. Power supply voltage: 220V 50Hz 2. Power: ＜2.5kW 3. Limit of vacuum degree: E-6mbar (E-5mbar can be reached when used with our company’s equipment) 4. Heating temperature: RT-500℃, accuracy ±1℃ (Temperature can be increased according to actual needs.) 5. Number of target guns: 3 pcs 6. Cooling method of target gun: water cooling 7. Size of target material: Ø2″, thickness 0.1-5mm (different thicknesses due to different target materials) 8. DC sputtering power: 500W (optional) 9. RF sputtering power: 300W/500W (optional) 10. Sample stage: Ø140mm, optional bias voltage function can be installed according to customer requirements to achieve higher quality of coating. 11. Speed of sample stage: adjustable within 1rpm to 20rpm 12. Working gas: Ar , N2 and other inert gases 13. Intake air path: Mass flow meter controls 2 air-intake paths, one is 100SCCM and the other is 200SCCM. |
Product Dimension and Weight | Main machine dimension: 500mm×560mm×660mm Overall dimension: 1300mm×660mm×1200mm Weight: 160kg |
Standard Accessories | 1. DC Power Control System: 2 set 2. RF Power Control System: 1 set 3. Film Thickness Monitor System: 1 set 4. Molecular Pump (imported from Germany): 1 pcs 5. Water Cooler: 1 pcs 6. Polyester PU pipe (Ø6mm): 4m |
Optional Accessories | 1. Various target materials such as gold, indium, silver, platinum, etc. 2. Mask 3. Vibrating Sample Stage |
Warranty
One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)
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