VTC-600-1HD Single-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc.
VTC-600-1HD single-head magnetron sputtering coater is equipped with one target gun, choosing a strong magnetic target or a weak magnetic target.
VTC-600-1HD Single-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc.
VTC-600-1HD single-head magnetron sputtering coater is equipped with one target gun, choosing a strong magnetic target or a weak magnetic target.
Main Features
1. It is equipped with one target gun, choosing one RF power supply for sputter coating of non-conductive materials or one DC power supply is used for sputter coating of conductive materials.
2. A variety of thin films can be prepared with a wide range of applications.
3. Small size and easy to operate
Technical Parameters
Product Name | VTC-600-1HD Single-Head Magnetron Sputtering Coater |
Product Model | VTC-600-1HD |
Installation Conditions | This equipment is required to be used at an altitude of 1000m or less, a temperature of 25℃±15℃, and a humidity of 55%Rh±10%Rh. 1. Water: The equipment is equipped with a self-circulating water cooler (filling with pure water or deionized water) 2. Electricity: AC220V 50Hz, must have good grounding 3. gas: The equipment chamber needs to be filled with argon gas (purity 99.99% or more), and argon gas cylinders (with Ø6mm double ferrule joints) and pressure reducing valve need to be provided by users. 4. Workbench: size 1500mm×600mm×700mm, bearing more than 200kg 5. Ventilation device: needed |
Major Parameters (Specification) | 1. Power supply voltage: 220V 50Hz 2. Power:<1KW (not including vacuum pump) 3. Inner diameter of Chamber: Ø300mm 4. Limit of vacuum degree: 9.0×10-4Pa 5. Heating temperature of sample stage: RT-500℃, accuracy ±1℃ (Temperature can be increased according to actual needs.) 6. Number of target guns: 1 pcs (other quantities for option) 7. Cooling method of target gun: water cooling 8. Size of target material: Ø2″, thickness 0.1-5mm (different thicknesses due to different target materials) 9. DC sputtering power: 500W; RF sputtering power: 300W (The type of target power supply is optional: one DC power supply or one RF power supply.) 10. Sample stage: Ø140mm, optional bias voltage function can be installed according to customer requirements to achieve higher quality of coating. 11. Speed of sample stage: adjustable within 1rpm-20rpm 12. Working gas: Ar and other inert gases 13. Intake air path: Mass flow meter controls 2 air-intake paths, one is 100SCCM and the other is 200SCCM. |
Product Dimension and Weight | 1. main machine dimension: 500mm×560mm×660mm 2. Overall dimension: 1300mm×660mm×1200mm 3. Weight: 160kg 4. Vacuum chamber dimension: φ300×300mm |
Standard Accessories | 1. DC power control system: 1 set (optional) 2. RF power control system: 1 set (optional) 3. Water cooler: 1 pcs 4. Polyester PU pipe (Ø6mm): 4m |
Optional Accessories | 1. Various target materials such as gold, indium, silver, platinum, etc. 2. Film thickness monitor system 3. molecular pump (imported from Germany) |
Warranty
One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)
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