Laboratory Vacuum 8 inches spin coater with heating function for For Perovskite Solar Cells Reseach MG-EZ8-H

This spin coater adopts advanced precision motor, the maximum speed can reach 10,000rpm, which effectively guarantees the uniformity of film formation. In addition to the basic spin coater function, this product is also equipped with heating elements, which can be heated up to 200℃, temperature controlled by an intelligent temperature control meter, accurate temperature measurement, and completely controlled temperature rise process. In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost. It is very suitable for laboratory purchase.

Spin coater with heating cover application:

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Spin coater with heating cover technical parameters:

Spin coater is a laboratory equipment widely used for coating uniform thin films, and is commonly used in the fields of materials science, electronics, optics and chemistry. Its main uses and working principles are as follows:

Use

Photoresist coating: In microelectronics and semiconductor manufacturing, spin coater is often used to coat photoresist on substrates for subsequent photolithography processes.

Thin film preparation: Used to prepare uniform organic or inorganic thin films, such as the active layer in perovskite solar cells, the light-emitting layer in OLEDs, etc.

Protective coating: Provide a protective coating for samples to prevent oxidation, corrosion, etc.

Biomedical applications: Prepare functional films for biosensors or drug delivery.

Principle

The working principle of spin coater is based on centrifugal force, and the specific steps are as follows:

Coating solution: Drop the solution to be coated on the center of the substrate.

Rotation: After the equipment is started, the substrate starts to rotate at high speed. The rotation speed and time can be adjusted as needed.

Diffusion and film formation: Due to the action of centrifugal force, the solution diffuses outward from the center of the substrate to form a thin film. At the same time, the volatilization of the solution causes the film to gradually dry and solidify.

Uniformity: By adjusting the spin speed and time, the thickness and uniformity of the film can be controlled. Generally, the higher the spin speed, the thinner the film.

Specific parameters

Spin speed: Generally ranges from a few hundred revolutions per minute (RPM) to a few thousand RPM.

Time: Varies from a few seconds to a few minutes, depending on the properties of the solution and the desired film thickness.

Notes

Solution properties: The viscosity, volatility, and surface tension of the solution will affect the coating effect.

Environmental conditions: Temperature and humidity will also affect the formation and quality of the film.

Spin coater is a key equipment for preparing high-quality, uniform films, and is widely used in scientific research and industrial production.