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Laboratory compact spin coater / Spin Processor EZ4 + Oil-free vacuum pump + VACUUM SPIN CHUCK 110V/220V

Spin coater is a laboratory equipment widely used for coating uniform thin films, and is often used in the fields of materials science, electronics, optics and chemistry.


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product details

Laboratory compact spin coater / Spin Processor EZ4 + Oil-free vacuum pump + VACUUM SPIN CHUCK 110V/220V

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1.Small appearance, suitable for glove box operation

 2. Corrosion resistant transparent cover, constant torque positioning chain

 3. Integrated mold opening cavity, easy to disassemble and clean, easy to replace

 4 .LCD text display, color mask key, easy to use

 5. The speed of addition and reduction is controllable and adjustable, and multi-step program operation control can be set

 6. Brushless DC motor, maximum recommended spin coating size :4 inches round substrate

 7. Aluminum alloy shell (EZ4-S), corrosion resistant PP shell optional (EZ4-S-PP)

  

Product Parameter

range of speed

100-10000rpm

Speed resolution

1rpm

Adjustable range of acceleration

100-10000rpm/s

Maximum single step length

3000S

temporal resolution

1s

Wide voltage application

AC100-230V input, English and Chinese optional

Required Vacuum

0.06-0.09Mpa,Minimum 15L/Min flow rate

Vacuum Tubing4mm ID, 6mm OD
Fuse2 A(installed)

Single step or multi-step operation is optional. Up to 5 groups of 5-step programs can be set

Standard with 10mm, 25mm, 2 - inch vacuum chuck

 

Packing List

EZ4 compact spin coater  machine

power cable

English manual

pU vacuum tube (Φ6*4mm X 2m)

Oil-free vacuum pump

STANDARD VACUUM SPIN CHUCK   (1pcs Φ10mm, 1pcs Φ25mm, 1pcs Φ55mm)



Spin coater is a laboratory equipment widely used for coating uniform thin films, and is commonly used in the fields of materials science, electronics, optics and chemistry. Its main uses and working principles are as follows:


Use

Photoresist coating: In microelectronics and semiconductor manufacturing, spin coater is often used to coat photoresist on substrates for subsequent photolithography processes.

Thin film preparation: Used to prepare uniform organic or inorganic thin films, such as the active layer in perovskite solar cells, the light-emitting layer in OLEDs, etc.

Protective coating: Provide a protective coating for samples to prevent oxidation, corrosion, etc.

Biomedical applications: Prepare functional films for biosensors or drug delivery.


Principle

The working principle of spin coater is based on centrifugal force, and the specific steps are as follows:

Coating solution: Drop the solution to be coated on the center of the substrate.

Rotation: After the equipment is started, the substrate starts to rotate at high speed. The rotation speed and time can be adjusted as needed.

Diffusion and film formation: Due to the action of centrifugal force, the solution diffuses outward from the center of the substrate to form a thin film. 

At the same time, the volatilization of the solution causes the film to gradually dry and solidify.

Uniformity: By adjusting the spin speed and time, the thickness and uniformity of the film can be controlled. Generally, the higher the spin speed, the thinner the film.


Specific parameters

Spin speed: Generally ranges from a few hundred revolutions per minute (RPM) to a few thousand RPM.

Time: Varies from a few seconds to a few minutes, depending on the properties of the solution and the desired film thickness.


Notes

Solution properties: The viscosity, volatility, and surface tension of the solution will affect the coating effect.

Environmental conditions: Temperature and humidity will also affect the formation and quality of the film.


Spin coater is a key equipment for preparing high-quality, uniform films, and is widely used in scientific research and industrial production.