Spin coater is a laboratory equipment widely used for coating uniform thin films, and is often used in the fields of materials science, electronics, optics and chemistry.
Spin coater is a laboratory equipment widely used for coating uniform thin films, and is often used in the fields of materials science, electronics, optics and chemistry.
Laboratory compact spin coater / Spin Processor EZ4 + Oil-free vacuum pump + VACUUM SPIN CHUCK 110V/220V
1.Small appearance, suitable for glove box operation
2. Corrosion resistant transparent cover, constant torque positioning chain
3. Integrated mold opening cavity, easy to disassemble and clean, easy to replace
4 .LCD text display, color mask key, easy to use
5. The speed of addition and reduction is controllable and adjustable, and multi-step program operation control can be set
6. Brushless DC motor, maximum recommended spin coating size :4 inches round substrate
7. Aluminum alloy shell (EZ4-S), corrosion resistant PP shell optional (EZ4-S-PP)
Product Parameter | |
range of speed | 100-10000rpm |
Speed resolution | 1rpm |
Adjustable range of acceleration | 100-10000rpm/s |
Maximum single step length | 3000S |
temporal resolution | 1s |
Wide voltage application | AC100-230V input, English and Chinese optional |
Required Vacuum | 0.06-0.09Mpa,Minimum 15L/Min flow rate |
Vacuum Tubing | 4mm ID, 6mm OD |
Fuse | 2 A(installed) |
Single step or multi-step operation is optional. Up to 5 groups of 5-step programs can be set | |
Standard with 10mm, 25mm, 2 - inch vacuum chuck |
Packing List
EZ4 compact spin coater machine
power cable
English manual
pU vacuum tube (Φ6*4mm X 2m)
Oil-free vacuum pump
STANDARD VACUUM SPIN CHUCK (1pcs Φ10mm, 1pcs Φ25mm, 1pcs Φ55mm)
Spin coater is a laboratory equipment widely used for coating uniform thin films, and is commonly used in the fields of materials science, electronics, optics and chemistry. Its main uses and working principles are as follows:
Use
Photoresist coating: In microelectronics and semiconductor manufacturing, spin coater is often used to coat photoresist on substrates for subsequent photolithography processes.
Thin film preparation: Used to prepare uniform organic or inorganic thin films, such as the active layer in perovskite solar cells, the light-emitting layer in OLEDs, etc.
Protective coating: Provide a protective coating for samples to prevent oxidation, corrosion, etc.
Biomedical applications: Prepare functional films for biosensors or drug delivery.
Principle
The working principle of spin coater is based on centrifugal force, and the specific steps are as follows:
Coating solution: Drop the solution to be coated on the center of the substrate.
Rotation: After the equipment is started, the substrate starts to rotate at high speed. The rotation speed and time can be adjusted as needed.
Diffusion and film formation: Due to the action of centrifugal force, the solution diffuses outward from the center of the substrate to form a thin film.
At the same time, the volatilization of the solution causes the film to gradually dry and solidify.
Uniformity: By adjusting the spin speed and time, the thickness and uniformity of the film can be controlled. Generally, the higher the spin speed, the thinner the film.
Specific parameters
Spin speed: Generally ranges from a few hundred revolutions per minute (RPM) to a few thousand RPM.
Time: Varies from a few seconds to a few minutes, depending on the properties of the solution and the desired film thickness.
Notes
Solution properties: The viscosity, volatility, and surface tension of the solution will affect the coating effect.
Environmental conditions: Temperature and humidity will also affect the formation and quality of the film.
Spin coater is a key equipment for preparing high-quality, uniform films, and is widely used in scientific research and industrial production.