The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.
Lab High speed Small Vacuum Spin Coater MG-EZ4-S-PMMA
This type of spin coater is designed small, and the whole body adopts aluminum alloy structure. The upper cover of the chamber is made of Acrylic material, and the appearance is beautiful and firm. The spin coater adopts advanced precision motor, the maximum speed can reach 10000rpm; the control relies on the high-brightness LCD screen, in addition to direct spin coating, it can pre-store the spin coating curve for program-controlled spin coating. The instrument effectively guarantees the performance and function of the instrument under the premise of greatly reducing the volume, which is very suitable for laboratory purchase.
The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.
Main features:
1.Small appearance, suitable for glove box operation
2. Corrosion resistant transparent cover, constant torque positioning chain
3. Integrated mold opening cavity, easy to disassemble and clean, easy to replace
4 .LCD text display, color mask key, easy to use
5. The speed of addition and reduction is controllable and adjustable, and multi-step program operation control can be set
6. Brushless DC motor, maximum recommended spin coating size :4 inches round substrate
7. Aluminum alloy shell (EZ4-S), corrosion resistant PP shell optional (EZ4-S-PP)
Item | Detail | |
Spin coater | Supply voltage | AC220V, 50Hz |
Spin speed | 0~10000rpm | |
Acceleration | 100~5000rpm/s | |
Speed resolution | 1rpm | |
Single step time | 3000s | |
Substrate size | Diameter ≤ 4 inches (100mm) | |
Chamber material | Acrylic material | |
Operation method | LCD screen （Chinese and English operation interface） | |
Dispensing method | Manual dispensing, optional precision syringe pump | |
Coating curve | Single step or multi-step operation is optional. Up to 5 groups of 5-step programs can be set | |
Wide voltage application | AC100-230V input, English and Chinese optional | |
Pumping port | Φ6mm quick screw joint | |
Overall size | 450mm×350mm×280mm | |
Total Weight | 15kg | |
Vacuum system | Vacuum pump: dry mechanical pump Flow rate: 50L/Min Function: vacuum adsorption of sample substrate | |
Standard configuration | three vacuum chucks: 10mm, 25mm, 55mm (more sizes can be customized); One oil-free vacuum pump （50L/min）； | |
Spin coater is a laboratory equipment widely used for coating uniform thin films, and is commonly used in the fields of materials science, electronics, optics and chemistry. Its main uses and working principles are as follows:
Use
Photoresist coating: In microelectronics and semiconductor manufacturing, spin coater is often used to coat photoresist on substrates for subsequent photolithography processes.
Thin film preparation: Used to prepare uniform organic or inorganic thin films, such as the active layer in perovskite solar cells, the light-emitting layer in OLEDs, etc.
Protective coating: Provide a protective coating for samples to prevent oxidation, corrosion, etc.
Biomedical applications: Prepare functional films for biosensors or drug delivery.
Principle
The working principle of spin coater is based on centrifugal force, and the specific steps are as follows:
Coating solution: Drop the solution to be coated on the center of the substrate.
Rotation: After the equipment is started, the substrate starts to rotate at high speed. The rotation speed and time can be adjusted as needed.
Diffusion and film formation: Due to the action of centrifugal force, the solution diffuses outward from the center of the substrate to form a thin film. At the same time, the volatilization of the solution causes the film to gradually dry and solidify.
Uniformity: By adjusting the spin speed and time, the thickness and uniformity of the film can be controlled. Generally, the higher the spin speed, the thinner the film.
Specific parameters
Spin speed: Generally ranges from a few hundred revolutions per minute (RPM) to a few thousand RPM.
Time: Varies from a few seconds to a few minutes, depending on the properties of the solution and the desired film thickness.
Notes
Solution properties: The viscosity, volatility, and surface tension of the solution will affect the coating effect.
Environmental conditions: Temperature and humidity will also affect the formation and quality of the film.
Spin coater is a key equipment for preparing high-quality, uniform films, and is widely used in scientific research and industrial production.
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